- [대학원 세미나] 10/1(금) Ian Mackenzie(ASML) "ASML high-level overview and MIT reluctance actuator project"
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기계공학부 구성원들의 많은 관심과 참여 부탁드립니다.
▣ Title: ASML high-level overview and MIT reluctance actuator project
▣ Affiliation: ASML
▣ Date: 2021. 10. 1.(Fri) 14:00
▣ Venue: Online(Zoom)
▣ Host: Prof. Junyoung Yoon
In this talk, a high-level overview of ASML lithography machines is presented, including ASML's DUV (deep ultraviolet) line and EUV (extreme ultraviolet) line, with a focus on mechatronics challenges. Also presented is ASML's next-generation High-NA (numerical aperture) EUV machine, enabling sub-8 nanometer critical dimensions on semiconductor products. Some of the actuation challenges are described, followed by a short overview of my Ph.D. work on reluctance actuation describing how reluctance actuation helps to achieve the high accelerations and high accuracy required for ASML's high-NA tool.