기계공학부 구성원들의 많은 관심과 참여 부탁드립니다.

▣ Title: ASML high-level overview and MIT reluctance actuator project

▣ Affiliation: ASML

▣ Date: 2021. 10. 1.(Fri) 14:00

▣ Venue: Online(Zoom)

▣ Host: Prof. Junyoung Yoon

▣ Abstract

In this talk, a high-level overview of ASML lithography machines is presented, including ASML's DUV (deep ultraviolet) line and EUV (extreme ultraviolet) line, with a focus on mechatronics challenges. Also presented is ASML's next-generation High-NA (numerical aperture) EUV machine, enabling sub-8 nanometer critical dimensions on semiconductor products. Some of the actuation challenges are described, followed by a short overview of my Ph.D. work on reluctance actuation describing how reluctance actuation helps to achieve the high accelerations and high accuracy required for ASML's high-NA tool.

Zoom: https://us02web.zoom.us/j/3824385800?pwd=OUFEWmtWaVpKcmhlU29ZcTloSkNqUT09